Material properties of heteroepitaxial yttria-stabilized zirconia films with controlled yttria contents on Si prepared by reactive sputtering
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference17 articles.
1. Heteroepitaxial Si films on yttria‐stabilized, cubic zirconia substrates
2. The dielectric properties of yttria-stabilized zirconia
3. Epitaxial growth of yttria‐stabilized zirconia films on silicon by ultrahigh vacuum ion beam sputter deposition
4. Heteroepitaxial Growth of Yttria-Stabilized Zirconia (YSZ) on Silicon
5. Epitaxial yttria‐stabilized zirconia on hydrogen‐terminated Si by pulsed laser deposition
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1. Nanocrystalline yttria stabilized zirconia by metal–PVA complexation;Ceramics International;2010-03
2. Enhancement of the crystalline quality of reactively sputtered yttria-stabilized zirconia by oxidation of the metallic target surface;Thin Solid Films;2009-08
3. Characterization of high-k HfO2 films prepared using chemically modified alkoxy-derived solutions;Journal of Applied Physics;2009-03-15
4. Sol-Gel Synthesis of High-kHfO2Thin Films;Journal of the American Ceramic Society;2009-01
5. Room-Temperature Electrical-Field Induced Oxygen Diffusion of Aluminum/Yttria-Stabilized Zirconia Thin Film Grown on Si Substrate;Japanese Journal of Applied Physics;2006-11-08
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