Room-Temperature Electrical-Field Induced Oxygen Diffusion of Aluminum/Yttria-Stabilized Zirconia Thin Film Grown on Si Substrate-Reference-Cited by-同舟云学术

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Room-Temperature Electrical-Field Induced Oxygen Diffusion of Aluminum/Yttria-Stabilized Zirconia Thin Film Grown on Si Substrate

Published:2006-11-08 Issue:11 Volume:45 Page:8827-8831
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Wakiya Naoki,Tajiri Naoya,Kiguchi Takanori,Mizutani Nobuyasu,Cross Jeffrey S.,Shinozaki Kazuo

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Direct measurement of oxygen incorporation into thin film oxides at room temperature upon ultraviolet photon irradiation;Applied Physics Letters;2008-12-29

2. Photon irradiation-induced structural and interfacial phenomena in pure and alio-valently doped zirconia thin films;Philosophical Magazine;2008-06-11

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