The deposition and characterisation of CVD tungsten silicide for applications in microelectronics
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference9 articles.
1. Crowder BL. Tungsten Workshop III, 1988. p. 3.
2. The manufacture and performance of diodes made in dielectrically isolated silicon substrates containing buried metallic layers
3. Resonant cavity longwave SiGe-Si photodetector using a buried silicide mirror
4. Substrate crosstalk suppression capability of silicon-on-insulator substrates with buried ground planes (GPSOI)
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