In situ gas-phase FTIR monitoring of liquid delivery MOCVD process for PZT film preparation-Reference-Cited by-同舟云学术

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In situ gas-phase FTIR monitoring of liquid delivery MOCVD process for PZT film preparation

Published:2008-01 Issue:1-2 Volume:135 Page:10-14
ISSN:1385-8947
Container-title:Chemical Engineering Journal
language:en
Short-container-title:Chemical Engineering Journal

Author:

Funakubo Hiroshi,Asano Gouji,Tonari Kazuaki,Takamatsu Yukichi,Ohtsuki Kunio,Satake Tsukasa

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,General Chemical Engineering,Environmental Chemistry,General Chemistry

Reference9 articles.

1. Octahedral tilting in perovskites. II. Structure stabilizing forces;Woodward;Acta Cryst.,1997

2. Chemical vapor deposition of materials: part 1. An overview of CVD processes;Hampden-Smith;Chem. Vapor Deposit.,1995

3. Composition control of Pb(ZrxTi1−x)O3 thin films prepared by metalorganic chemical vapor deposition;Nagashima;Jpn. J. Appl. Phys.,2000

4. Preparation of Pb(Zr,Ti)O3 thin films by metalorganic chemical vapor deposition for low voltage ferroelectric memory;Gilbert;J. Appl. Phys.,2003

5. In situ FTIR investigation of the effect of gas-phase reaction on the deposition of Pb(Zr,Ti)O3 films by MOCVD;Asano;Thin Solid Films,2006

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