A comparative study of air and nitrogen thermal plasmas for PFCs decomposition-Reference-Cited by-同舟云学术

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A comparative study of air and nitrogen thermal plasmas for PFCs decomposition

Published:2012-03 Issue: Volume:185-186 Page:193-200
ISSN:1385-8947
Container-title:Chemical Engineering Journal
language:en
Short-container-title:Chemical Engineering Journal

Author:

Choi Sooseok,Hong Sang Hee,Lee Hyun Seok,Watanabe Takayuki

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,General Chemical Engineering,Environmental Chemistry,General Chemistry

Reference35 articles.

1. PFCs in the semiconductor industry: a primer;Gompel;Semicon. Int.,2000

2. Atmospheric lifetimes of long-lived halogenated species;Ravishankara;Science,1993

3. Plasma–surface interactions;Chang;J. Vac. Sci. Technol. A,2003

4. Fluorinated gases for semiconductor manufacture: process advances in chemical vapor deposition chamber cleaning;Allgood;J. Fluorine Chem.,2003

5. Optimization of gas utilization in plasma processes;Namose;IEEE Trans. Semicon. Manufacturing,2003

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