Fluorinated gases for semiconductor manufacture: process advances in chemical vapor deposition chamber cleaning-Reference-Cited by-同舟云学术

Fluorinated gases for semiconductor manufacture: process advances in chemical vapor deposition chamber cleaning

Published:2003-07 Issue:1 Volume:122 Page:105-112
ISSN:0022-1139
Container-title:Journal of Fluorine Chemistry
language:en
Short-container-title:Journal of Fluorine Chemistry

Author:

Allgood Charles C.

Publisher

Elsevier BV

Subject

Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry,Environmental Chemistry,Biochemistry

Reference14 articles.

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2. C. Allgood, Adv. Mater. 10 (15) (1998).

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4. C. Fraust, World Semiconductor Council ESH Task Force Update, SEMI Technical Program: A Partnership for PFC Emission Reduction, SEMI, Mountain View, CA, 1999, p. B1.

5. A. Johnson, et al., in: Proceedings of Semicon Southwest on A Partnership for PFC Emissions Reduction, Paper #12, Austin, TX, 2000.

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