Author:
Malz R.,Brinksmeier E.,Preuß W.,Kohlscheen J.,Stock H.-R.,Mayr P.
Reference11 articles.
1. Mechanisms of reactive sputtering of TiN and TiC II;Sundgren;Thin Sol Films,1983
2. Structure and properties of titanium nitride thin films deposited at low temperatures using direct current magnotron sputtering;Elstner;J Vac Sci Technol A,1994
3. Properties of magnetron-deposited polycrystalling TiN layers;Stanislav;Thin Sol Films,1990
4. Influence of substrate material and deposition parameters on the structure, residual stree, hardness and adhesion of sputtered CrxNy hard coating;Herr;Surf Coat Technol,1993
5. Brinksmeier E, Malz R. Manufacturing and measurement of microstructures using ultraprecision machining and atomic force microscopy. Actuator 96, Proc 5th International Conference on New Actuators, Bremen, 26–28 June 1996: pp. 92–5.
Cited by
16 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献