Author:
Lin Yibo,Yu Bei,Zou Yi,Li Zhuo,Alpert Charles J.,Pan David Z.
Subject
Electrical and Electronic Engineering,Hardware and Architecture,Software
Reference33 articles.
1. Design for manufacturing with emerging nanolithography;Pan;IEEE Trans. Comput.-Aided Des. Integr. Circuits Syst. (TCAD),2013
2. D.Z. Pan, L. Liebmann, B. Yu, X. Xu, Y. Lin, Pushing multiple patterning in sub-10nm: are we ready?, in: ACM/IEEE Design Automation Conference (DAC), 2015, pp. 197:1–197:6.
3. Design for manufacturability and reliability in extreme-scaling VLSI;Yu;Sci. China Inf. Sci.,2016
4. Future of multiple-e-beam direct-write systems;Lin;J. Micro/Nanolithogr. MEMS MOEMS (JM3),2012
5. C. Van den Berg, G. De Boer, S. Boschker, E. Hakkennes, G. Holgate, M. Hoving, R. Jager, J. Koning, V. Kuiper, Y. Ma, et al., Scanning exposures with a MAPPER multibeam system, in: Proceedings of SPIE, volume 7970, 2011.
Cited by
8 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. A New Simulation Method for 3-D Electron Beam Lithography;2023 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO);2023-07-31
2. Stitch-avoiding Detailed Routing for Multiple E-Beam Lithography;2022 IFIP/IEEE 30th International Conference on Very Large Scale Integration (VLSI-SoC);2022-10-03
3. Recent research progress of master mold manufacturing by nanoimprint technique for the novel microoptics devices;Frontiers of Materials Science;2022-09
4. Topological sensing with photonic arrays of resonant circular waveguides;Physical Review Research;2021-07-30
5. ASAP;Proceedings of the 39th International Conference on Computer-Aided Design;2020-11-02