Role of the slow diffusion species in the dewetting of compounds: The case of NiSi on a Si isotope multilayer studied by atom probe tomography
Author:
Publisher
Elsevier BV
Subject
Metals and Alloys,Polymers and Plastics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference54 articles.
1. Towards implementation of a nickel silicide process for CMOS technologies;Lavoie;Microelectron. Eng.,2003
2. High-temperature degradation of NiSi films: agglomeration versus NiSi[sub 2] nucleation;Deduytsche;J. Appl. Phys.,2005
3. Formation of silicon islands on a silicon on insulator substrate upon thermal annealing;Legrand;Appl. Phys. Lett.,2000
4. Agglomeration control during the selective epitaxial growth of Si raised sources and drains on ultra-thin silicon-on-insulator substrates;Jahan;J. Cryst. Growth,2005
5. Complex dewetting scenarios captured by thin-film models;Becker;Nat. Mater.,2003
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Influence of the annealing schemes on the formation and stability of Ni(Pt)Si thin films: Partial, laser, total, and one-step annealings;Materials Science in Semiconductor Processing;2024-12
2. C54-TiSi2 formation using nanosecond laser annealing of A-Si/Ti/A-Si stacks;Thin Solid Films;2024-06
3. On the influence of Ni(Pt)Si thin film formation on agglomeration threshold temperature and its impact on 3D imaging technology integration;Microelectronic Engineering;2023-03
4. Dewetting of Ni silicide thin film on Si substrate: In-situ experimental study and phase-field modeling;Acta Materialia;2022-01
5. The role of defects in solid state dewetting of ultrathin Ag film on Si(557);Scripta Materialia;2021-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3