Wet-chemical etching of metals for advanced semiconductor technology nodes: Ru etching in acidic Ce4+ solutions

Author:

Philipsen Harold,Mouwen Nils,Teck Sander,Monnens Wouter,Le Quoc Toan,Holsteyns Frank,Struyf Herbert

Publisher

Elsevier BV

Subject

Electrochemistry,General Chemical Engineering

Reference109 articles.

1. Galvanic effects in the wet-chemical etching of metal films;Kelly;Philips Tech. Rev.,1978

2. An electrochemical study of undercutting during etching of duplex metal films;Kelly;J. Electrochem. Soc.,1975

3. Electrochemical atomic layer etching of copper;Gong;J. Electrochem. Soc.,2018

4. Chemical etching and patterning of copper, silver, and gold films at low temperatures;Choi;ECS J. Solid State Sci. Technol.,2015

5. The etching of Ti adhesion layers in H2O2 solutions;van den Meerakker;J. Electrochem. Soc.,2002

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