Towards Structural Analysis of Polymeric Contaminants in Electrodeposited Cu films
Author:
Publisher
Elsevier BV
Subject
Electrochemistry,General Chemical Engineering
Reference44 articles.
1. Damascene copper electroplating for chip interconnections;Andricacos;IBM J. Res. Dev.,1998
2. Advanced Electrochemical Processes for Sub-50nm On-chip Metallization;Akolkar;ECS Transactions,2007
3. Electrochemical materials and processes in Si integrated circuit technology;Dubin;Electrochim. Acta,2007
4. Through silicon via: From the CMOS imager sensor wafer level package to the 3D integration;Gagnard;Microelectron. Eng.,2010
5. Classification of suppressor additives based on synergistic and antagonistic ensemble effects;Broekmann;Electrochim. Acta,2011
Cited by 25 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Molecular dynamics simulations and analyzation of Cu deposited on stainless steel substrate surfaces;Surface Topography: Metrology and Properties;2024-07-01
2. Theoretical and experimental research on electroplating additives in chip metal interconnects;SCIENTIA SINICA Chimica;2023-08-25
3. The 2023 Emerging Leader in Atomic Spectroscopy Award;Spectroscopy;2023-01-01
4. Studies of Bis-(Sodium-Sulfopropyl)-Disulfide and 3-Mercapto-1-Propanesulfonate on/into the Copper Electrodeposited Layer by Time-of-Flight Secondary-Ion Mass Spectrometry;Molecules;2022-11-22
5. Effect of Chloride on Microstructure in Cu Filled Microscale Through Silicon Vias;Journal of The Electrochemical Society;2021-11-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3