Optical Methods for Fine Line Lithography-Reference-Cited by-同舟云学术

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Optical Methods for Fine Line Lithography

Published:1980 Issue: Volume: Page:105-232
ISSN:0167-790X
Container-title:Fine Line Lithography
language:
Short-container-title:

Author:

LIN B.J.

Publisher

Elsevier

Reference79 articles.

1. Altman F. E., 1956, US patent No. 2 742 817.

2. Altman N. G., 1968, paper presented at SPSE on: Fundamentals and Applications of Microphotography.

3. Diffraction of Electromagnetic Waves by an Aperture in a Large Screen

4. The Encyclopedia of Physics;Besançon,1974

5. Vacuum ultraviolet holography

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Simulation of mask proximity printing;Journal of Micro/Nanolithography, MEMS, and MOEMS;2007-04-01

2. Matching the Resolution of Electron Beam Lithography by Scanning Near-Field Photolithography;Nano Letters;2004-06-30

3. Fabrication of diffractive optical elements with arbitrary surface-relief profile by direct laser writing;Optical Engineering;2002-06-01

4. Stability and quantum efficiency of a novel type of a-Si:H/a-SiC:H based UV detector;Thin Solid Films;1999-01

5. Lithography;Fundamentals of Semiconductor Processing Technology;1995

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