Low-field microwave absorption in pulse laser deposited FeSi thin film-Reference-Cited by-同舟云学术

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Low-field microwave absorption in pulse laser deposited FeSi thin film

Published:2012-03 Issue:6 Volume:324 Page:1172-1176
ISSN:0304-8853
Container-title:Journal of Magnetism and Magnetic Materials
language:en
Short-container-title:Journal of Magnetism and Magnetic Materials

Author:

Gavi H.,Ngom B.D.,Beye A.C.,Strydom A.M.,Srinivasu V.V.,Chaker M.,Manyala N.

Funder

University of Pretoria research development program and NRF/Ithemba LABS

Publisher

Elsevier BV

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference19 articles.

1. Paramagnetic Excited State of FeSi

2. Magnetic behavior of the monosilicides of the 3d-transition elements

3. Undoped and doped FeSi or how to make a heavy fermion metal with three of the most common elements

4. Unconventional charge gap formation in FeSi

5. Structural and magnetic properties of ε-Fe1−xCoxSi thin films deposited via pulsed laser deposition

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