Low-temperature PECVD deposition of highly conductive n-type microcrystalline silicon thin films for optoelectronic applications
Author:
Affiliation:
1. Qatar Environment and Energy Research Institute (QEERI), Hamad bin Khalifa University (HBKU),Doha,Qatar Foundation,Qatar
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9938432/9938453/09938628.pdf?arnumber=9938628
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5. Photovoltaic Properties of a-Si:H Films Grown by Plasma Enhanced Chemical Vapor Deposition: A Review
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