Polycrystalline 3C-SiC thin films deposited by dual precursor LPCVD for MEMS applications-Reference-Cited by-同舟云学术

Polycrystalline 3C-SiC thin films deposited by dual precursor LPCVD for MEMS applications

Published:2005-03 Issue:1 Volume:119 Page:169-176
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

Fu Xiao-An,Dunning Jeremy L.,Zorman Christian A.,Mehregany Mehran

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference24 articles.

1. Silicon carbide for microelectromechanical systems;Mehregany;Int. Mat. Rev.,2000

2. Silicon carbide as a new MEMS technology;Sarro;Sens. Actuat.,2000

3. SiC MEMS: opportunities and challenges for applications in harsh environments;Mehregany;Thin Solid Films,1999

4. Fabrication and testing of surface micromachined polycrystalline SiC micromotors;Yasseen;Electron Device Lett.,2000

5. Development of a multilayer SiC surface micromachining process with capabilities and design rules comparable to conventional polysilicon surface micromachining;Song;Mater. Sci. Forum,2002

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