Alternative dielectric films for rf MEMS capacitive switches deposited using atomic layer deposited Al2O3/ZnO alloys-Reference-Cited by-同舟云学术

Alternative dielectric films for rf MEMS capacitive switches deposited using atomic layer deposited Al2O3/ZnO alloys

Published:2007-03 Issue:1 Volume:135 Page:262-272
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

Herrmann Cari F.,DelRio Frank W.,Miller David C.,George Steven M.,Bright Victor M.,Ebel Jack L.,Strawser Richard E.,Cortez Rebecca,Leedy Kevin D.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference37 articles.

1. Lifetime characterization of capacitive RF MEMS switches;Goldsmith,2001

2. RF MEMS Theory, Design and Technology;Rebeiz,2003

3. Handbook of Thin-Film Deposition Processes and Techniques: Principles, Methods, Equipment and Applications;Seshan,2002

4. Fundamentals of Microfabrication: The Science of Miniaturization;Madu,2002

5. Properties of ZnO/Al2O3 alloy films grown using atomic layer deposition techniques;Elam;J. Electrochem. Soc.,2003

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