Determination of the surface excitation parameter for oxides: TiO2, SiO2, ZrO2 and Al2O3
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference33 articles.
1. Electron energy barriers between (100)Si and ultrathin stacks of SiO2, Al2O3, and ZrO2 insulators
2. Electronic properties of ultrathin HfO2, Al2O3, and Hf–Al–O dielectric films on Si(100) studied by quantitative analysis of reflection electron energy loss spectra
3. Electronic properties of ultrathin (HfO2)x(SiO2)1−x dielectrics on Si (100)
4. An XPS study of the dispersion of MoO3 on TiO2–ZrO2, TiO2–SiO2, TiO2–Al2O3, SiO2–ZrO2, and SiO2–TiO2–ZrO2 mixed oxides
5. Up-conversion emission in violet from yellow in Nd3+: SiO2–TiO2–Al2O3 sol-gel glasses
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