Si(111)–H(1×1): A mirror for atoms characterized by AFM, STM, He and H2 diffraction-Reference-Cited by-同舟云学术

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Si(111)–H(1×1): A mirror for atoms characterized by AFM, STM, He and H2 diffraction

Published:2007-01 Issue:1 Volume:601 Page:24-29
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Barredo D.,Calleja F.,Weeks A.E.,Nieto P.,Hinarejos J.J.,Laurent G.,Vazquez de Parga A.L.,MacLaren D.A.,Farías D.,Allison W.,Miranda R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference21 articles.

1. An atom-focusing mirror

2. Focusing Elements and Design Considerations for a Scanning Helium Microscope (SHeM)

3. STM study of Si(111)1 × 1-H surfaces prepared by in situ hydrogen exposure

4. Silicon surface passivation by hydrogen termination: A comparative study of preparation methods

5. An AFM study of the processing of hydrogen passivated silicon(111) of a low miscut angle

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