Simulation and measurement of AES depth profiles; a case study of the C/Ta/C/Si system-Reference-Cited by-同舟云学术

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Simulation and measurement of AES depth profiles; a case study of the C/Ta/C/Si system

Published:2010-04 Issue:7-8 Volume:604 Page:633-640
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Zommer Ludomir,Jablonski Alexander,Kotis László,Safran Gyorgy,Menyhárd Miklós

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference24 articles.

1. Practical Surface Analysis;Hofmann,1990

2. Atomic mixing, surface roughness and information depth in high-resolution AES depth profiling of a GaAs/AlAs superlattice structure

3. Handbook of Surface and Interface Analysis;Bertoti,1998

4. Improved depth resolution by sample rotation during Auger electron spectroscopy depth profiling

5. Surface Analysis by Auger and X-ray Photoelectron Spectroscopy;Seah,2003

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1. XPS depth profiling of nano-layers by a novel trial-and-error evaluation procedure;Scientific Reports;2024-08-09

2. Design and production of tungsten-carbide rich coating layers;Applied Surface Science;2022-06

3. Evaluation of AES depth profiles with serious artefacts in C/W multilayers;Applied Surface Science;2022-04

4. Interface induced diffusion;Scientific Reports;2021-04-29

5. Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces;Scientific Reports;2018-02-01

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