Adsorption and reactions of HN3 on Si(100)-2×1: A computational study
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference51 articles.
1. Plasma enhanced chemical vapor deposition: Differences between direct and remote plasma excitation
2. Pressure‐dependent transition in the mechanism of remote plasma SiNxdeposition
3. Photoemission studies of the reactions of ammonia and N atoms with Si(100)-(2×1) and Si(111)-(7×7) surfaces
4. Study of the mechanisms of GaN film growth on GaAs surfaces by thermal and plasma nitridation
5. Photodesorption of NH3 from GaAs. A resonance-enhanced multiphoton ionization study
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