Reaction of cyanide ions with copper on Si surfaces and its use for Si cleaning-Reference-Cited by-同舟云学术

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Reaction of cyanide ions with copper on Si surfaces and its use for Si cleaning

Published:2006-03 Issue:5 Volume:600 Page:1165-1169
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Liu Yueh-Ling,Fujiwara Naozumi,Iwasa Hitoo,Takahashi Masao,Imai Shigeki,Kobayashi Hikaru

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference29 articles.

1. Surface photovoltage analysis of phase transformation of copper in p-type silicon

2. Detection of Metallic Contaminants on Silicon by Surface Sensitive Minority Carrier Lifetime Measurements

3. Detection of copper contamination in silicon by surface photovoltage diffusion length measurements

4. Improved copper detection in hydrofluoric acid by recombination lifetime measurements on dedicated silicon substrates

5. Reduction of surface roughening due to copper contamination prior to ultra-thin gate oxidation

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Chemical States of Copper Contaminants on SiO2 Surfaces and Their Removal by ppm-order HCN Aqueous Solutions;Journal of The Electrochemical Society;2011

2. A novel surface cleaning method for chemical removal of fouling lead layer from chromium surfaces;Applied Surface Science;2010-10

3. Passivation of defect states in surface and edge regions on pn-junction Si solar cells by use of hydrogen cyanide solutions;Open Physics;2009-01-01

4. Si cleaning method without surface morphology change by cyanide solutions;Applied Surface Science;2008-04

5. Complete Removal of Copper Contaminants on Bare Silicon Surfaces by Use of HCN Aqueous Solutions;Journal of The Electrochemical Society;2008

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