Theoretical study on diffusion mechanism of fluorine atom adsorbed on Si(111) reconstructed surface
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference27 articles.
1. Surface science aspects of etching reactions
2. The etching of silicon with XeF2vapor
3. XeF2etching of Si(111): The geometric structure of the reaction layer
4. Energy Dependence of Abstractive Versus Dissociative Chemisorption of Fluorine Molecules on the Silicon (111)-(7×7) Surface
5. Direct Chemisorption Site Selectivity for Molecular Halogens on the Si(111)-(7×7)Surface
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