Photoemission studies of pulsed-RF plasma nitrided ultra-thin SiON dielectric layers
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference20 articles.
1. Impact of decoupled plasma nitridation of ultra-thin gate oxide on the performance of p-channel MOSFETs
2. Angle resolved X-ray photoelectron spectroscopic study of ultrathin oxynitrides
3. Profiling nitrogen in ultrathin silicon oxynitrides with angle-resolved x-ray photoelectron spectroscopy
4. Angle-resolved XPS study on chemical bonds in ultrathin silicon oxynitride films
5. Surface nitridation of silicon dioxide with a high density nitrogen plasma
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Two-dimensional charge carrier distribution in MoS2 monolayer and multilayers;Applied Physics Letters;2019-03-11
2. Ultrasmooth ultrathin Ag films by AlN seeding and Ar/N2 sputtering for transparent conductive and heating applications;APL Materials;2018-12
3. Improved interfacial and electrical properties of HfLaON gate dielectric Ge MOS capacitor by NbON/Si dual passivation layer and fluorine incorporation;Applied Physics Letters;2016-11-07
4. Interfacial reactions during sputter deposition of Ta and TaN films on organosilicate glass: XPS and TEM results;Applied Surface Science;2007-05
5. Thermal stability of nitrogen-doped SrTiO3 films: Electronic and optical properties studies;Journal of Applied Physics;2007-03-15
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3