First nucleation steps during deposition of SiO2 thin films by plasma enhanced chemical vapour deposition-Reference-Cited by-同舟云学术

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First nucleation steps during deposition of SiO2 thin films by plasma enhanced chemical vapour deposition

Published:2007-05 Issue:10 Volume:601 Page:2223-2231
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Dudeck D.,Yanguas-Gil A.,Yubero F.,Cotrino J.,Espinós J.P.,de la Cruz W.,González-Elipe A.R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference36 articles.

1. Nucleation theory and the early stages of thin film growth

2. Enhanced nucleation, smoothness and conformality of ultrananocrystalline diamond (UNCD) ultrathin films via tungsten interlayers

3. Mathematical description of atomic layer deposition and its application to the nucleation and growth of HfO2 gate dielectric layers

4. Microscopic view of epitaxial metal growth: nucleation and aggregation

5. Ultrathin metal films and particles on oxide surfaces: structural, electronic and chemisorptive properties

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1. Process development and validation of next generation 3D calibration standards for application in optical microscopy;Measurement Science and Technology;2024-06-04

2. Formation of SiO2 thin films through plasma- enhanced chemical vapor deposition using SiH4/Ar/N2O;Thin Solid Films;2024-05

3. Exploring the functionalization of Ti-6Al-4V alloy with the novel antimicrobial peptide JIChis-2 via plasma polymerization;Biofouling;2023-01-02

4. Statistical, morphological, and corrosion behavior of PECVD derived cobalt oxide thin films;Journal of Materials Science: Materials in Electronics;2019-11-12

5. Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO x on polypropylene;Contributions to Plasma Physics;2018-05-09

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