Limited influence of grain boundary defects in hot-wire CVD polysilicon films on solar cell performance
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference14 articles.
1. Purely Intrinsic Poly-Silicon Films by Hot Wire Chemical Vapor Deposition
2. J.K. Rath et al., Tech. Digest Int. PVSEC-9, Miyazaki, Japan, 1996, p. 227.
3. Low-temperature deposition of polycrystalline silicon thin films by hot-wire CVD
4. Device-quality polycrystalline and amorphous silicon films by hot-wire chemical vapour deposition
5. Production of high‐quality amorphous silicon films by evaporative silane surface decomposition
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