Study of SiO decomposition kinetics and formation of Si nanocrystals in an SiO2 matrix-Reference-Cited by-同舟云学术

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Study of SiO decomposition kinetics and formation of Si nanocrystals in an SiO2 matrix

Published:1998-05 Issue: Volume:227-230 Page:507-512
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Hinds B.J,Wang F,Wolfe D.M,Hinkle C.L,Lucovsky G

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference14 articles.

1. Chemical and electronic structure of the SiO2/Si interface

2. Si‐SiO2interface structures on Si(100), (111), and (110) surfaces

3. Crystallographic study of semi‐insulating polycrystalline silicon (SIPOS) doped with oxygen atoms

4. AES of semi-insulating polycrystalline silicon layers

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3. Rapid thermal annealing of Si paste film and pn-junction formation;Nanotechnology;2020-07-02

4. Electrochemistry and Thermal Behavior of SiOx Made by Reactive Gas Milling;Journal of The Electrochemical Society;2020-01-08

5. Electron Emission Properties of Silicon-Rich Silicon Oxide Film Prepared by Reactive Magnetron Sputtering Deposition and Rapid Thermal Annealing;Materials Research;2020

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