Electron Emission Properties of Silicon-Rich Silicon Oxide Film Prepared by Reactive Magnetron Sputtering Deposition and Rapid Thermal Annealing
Author:
Affiliation:
1. Xi’an Jiaotong University, China
2. Kunming institute of physics, China
Publisher
FapUNIFESP (SciELO)
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Link
http://www.scielo.br/pdf/mr/v23n1/1516-1439-mr-23-1-e20190401.pdf
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