Zinc Oxynitride Films Prepared by Pulsed Laser Deposition-Reference-Cited by-同舟云学术

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Zinc Oxynitride Films Prepared by Pulsed Laser Deposition

Published:2014 Issue: Volume:17 Page:303-309
ISSN:2212-0173
Container-title:Procedia Technology
language:en
Short-container-title:Procedia Technology

Author:

Ayouchi R.,Melo L. Soares de,Bhattacharyya S.R.,Bundaleski N.,Teodoro O.,Santos L.,Schwarz R.

Publisher

Elsevier BV

Subject

General Earth and Planetary Sciences,General Environmental Science

Reference9 articles.

1. RF-plasma assisted PLD growth of Zn3N2 thin films

2. Zinc nitride films prepared by reactive RF magnetron sputtering of zinc in nitrogen containing atmosphere

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. DC reactive sputtering of ZnON thin films: band gap engineering and associated evolution of microstructures;Materials Research Express;2024-01-01

2. Effect of nitrogen on the properties of nanostructured zinc nitride heterojunction prepared by reactive magnetron sputtering;Materials Science in Semiconductor Processing;2022-07

3. Characterisation of Zinc Oxynitride Thin Films Prepared Using Zinc(II) Complex of Hexamethylenetetramine as the Precursor;Materials Sciences and Applications;2022

4. Low temperature carrier transport mechanism in high-mobility zinc oxynitride thin-film transistors;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-05

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