Author:
Liu J.R,Wang X.M,Shao L,Chen H,Chu W.K
Subject
Instrumentation,Nuclear and High Energy Physics
Reference14 articles.
1. J. Matsuo, D. Takeuchi, T. Aoki, I. Yamada, in: E. Ishida, S. Banerjee, S. Meta, T.C. Smith, M. Current. L. Larson, A. Tash (Eds.), IEEE Proceedings of the 11th International Conference on Ion Implantation Technology, Austin, TX, Vol. 1(1), 16–21 June 1996, IEEE Service Center, Piscataway, NJ, 1997, p. 768
2. Implantation damage effect on boron annealing behavior using low-energy polyatomic ion implantation
3. Material Research Society Symposium Proceedings 1996, Vol. 427;Yamada,1997
4. Proceedings of the Application of Accelerators in Research and Industry’ 96;Toyoda,1997
5. Smoothing of YBa2Cu3O7−δ films by ion cluster beam bombardment
Cited by
7 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献