Author:
Webb R.P.,Winston S.H.,Gwilliam R.M.,Sealy B.J.,Boudreault G.,Jeynes C.,Kirkby K.J.
Subject
Instrumentation,Nuclear and High Energy Physics
Cited by
3 articles.
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1. Front-end process modeling in silicon;The European Physical Journal B;2009-11-07
2. Molecular dynamic simulation on boron cluster implantation for shallow junction formation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2006-10
3. Accurate Monte Carlo simulation of fluorine and BF2 ion implantation into crystalline silicon;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2004-02