Electromigration in integrated circuit interconnects studied by X-ray microscopy-Reference-Cited by-同舟云学术

Electromigration in integrated circuit interconnects studied by X-ray microscopy

Published:2003-01 Issue: Volume:199 Page:469-474
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Schneider G.,Denbeaux G.,Anderson E.,Bates W.,Salmassi F.,Nachimuthu P.,Pearson A.,Richardson D.,Hambach D.,Hoffmann N.,Hasse W.,Hoffmann K.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference10 articles.

1. L. Arnaud, G. Tartavel, T. Berger, D. Mariolle, Y. Gobil, I. Touet, in: Proceedings 37th International Reliability Physics Symposium 1999, San Diego, 1999

2. Electromigration path in Cu thin-film lines

3. Electromigration in integrated circuit conductors

4. In situ x-ray microscopic observation of the electromigration in passivated Cu interconnects

5. Proceedings of the Sixth International Conference;Yun,2000

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fabricating metal structures with taper angles and smooth sidewalls;Journal of Micromechanics and Microengineering;2017-11-07

2. Tomographic observation of integrated circuit based on x-ray microscopy;AOPC 2015: Advanced Display Technology; and Micro/Nano Optical Imaging Technologies and Applications;2015-10-15

3. Nano-Scale Analysis Using Synchrotron-Radiation: Applications in the Semiconductor Industry;Current Nanoscience;2008-08-01

4. High spatial resolution full-field microscopy using a desktop-size soft x-ray laser;SPIE Proceedings;2007-09-13

5. Soft X‐ray Microcopy at the ALS;Synchrotron Radiation News;2003-05