Author:
Umirzakov B.E.,Pugacheva T.S.,Tashatov A.T.,Tashmukhamedova D.A.
Subject
Instrumentation,Nuclear and High Energy Physics
Reference8 articles.
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2. The influence of alkali atoms implanted in silicon on the negative secondary ion emission
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4. F.G. Jurabekova, T.S. Pugacheva, D. Tashmuhamedova, B.E. Umirzakov, Izv. RAN, Ser. Phys. 62 (1998) 1455
5. S.P. Murarka, Silicides for VLSI Applications, Academic Press, New York 1983, p. 174
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