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High-energy Cu and O ion co-implantation into silica glasses

  • Published:1998-05 Issue:1-4 Volume:141 Page:246-251
  • ISSN:0168-583X
  • Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
  • language:en
  • Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Nakao Setsuo,Saitoh Kazuo,Ikeyama Masami,Niwa Hiroaki,Tanemura Seita,Miyagawa Yoshiko,Miyagawa Soji,Tazawa Masato,Jin Ping

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Cited by 25 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A study of the behaviour of copper in different types of silicate glasses implanted with Cu + and O + ions;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2017-09

2. Comparison of SIMS and RBS for depth profiling of silica glasses implanted with metal ions;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-05

3. Nanostructures by Ion Irradiation;Nanomaterials and Surface Engineering;2013-03-08

4. Effect of Zn Addition on Non-Resonant Third-Order Optical Nonlinearity of the Cu-Doped Germano-Silicate Optical Glass Fiber;Journal of Nanoscience and Nanotechnology;2012-01-01

5. Effect of thermal treatment on linear optical properties of Cu nanoclusters;Physica B: Condensed Matter;2009-01
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