Importance of Implantation Sequence in the Formation of Nanometer Size Colloid Particles Embedded in Amorphous SiO2: Formation of Composite Colloids with Cu Core and aCu2O Shell by Coimplantation of Cu and F-Reference-Cited by-同舟云学术

Importance of Implantation Sequence in the Formation of Nanometer Size Colloid Particles Embedded in Amorphous SiO2: Formation of Composite Colloids with Cu Core and aCu2O Shell by Coimplantation of Cu and F

Published:1995-01-02 Issue:1 Volume:74 Page:110-113
ISSN:0031-9007
Container-title:Physical Review Letters
language:en
Short-container-title:Phys. Rev. Lett.

Author:

Hosono Hideo

Publisher

American Physical Society (APS)

Subject

General Physics and Astronomy

Link

http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevLett.74.110/fulltext

Reference30 articles.

1. V Nonlinear Optics in Composite Materials: 1. Semiconductor and Metal Crystallites in Dielectrics

2. Peculiarities and application perspectives of metal-ion implants in glasses

3. Aggregation and migration of ion‐implanted silver in lithia‐alumina‐silica glass

4. Cross-sectional TEM observation of copper-implanted SiO2 glass

5. Coalescence of nanosized copper colloid particles formed in Cu‐implanted SiO2glass by implantation of fluorine ions: Formation of violet copper colloids

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