Prevention of impurity gettering in the RP/2 region of ion-implanted silicon by defect engineering
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference18 articles.
1. Proximity gettering with mega‐electron‐volt carbon and oxygen implantations
2. Detection of Metastabile Defective Regions in Ion-Implanted Silicon by Means of Metal Gettering
3. Impurity gettering to secondary defects created by MeV ion implantation in silicon
4. Depth profiling of vacancy clusters in MeV-implanted Si using Au labeling
5. Spatial distribution of defects in ion-implanted and annealed Si: The RP/2 effect
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4. Gettering layer for oxygen accumulation in the initial stage of SIMOX processing;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2009-05
5. The role of implantation-induced point defects for the redistribution of oxygen in silicon at high-temperature processing;Journal of Applied Physics;2008-11-15
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