Hot-wire chemical vapor deposition and characterization of polycrystalline silicon thin films using a two-step growth method
Author:
Publisher
Elsevier BV
Subject
Condensed Matter Physics,General Materials Science
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1. Microcrystalline silicon films fabricated by bias-assisted hot-wire chemical vapor deposition;Journal of Materials Science: Materials in Electronics;2013-08-21
2. Improvement of the Crystallinity of Silicon Films Deposited by Hot-Wire Chemical Vapor Deposition with Negative Substrate Bias;Journal of Electronic Materials;2013-05-25
3. Impact of hydrogen dilution on optical properties of intrinsic hydrogenated amorphous silicon films prepared by high density plasma chemical vapor deposition for solar cell applications;Journal of Modern Optics;2013-01
4. Effect of substrate bias on the properties of microcrystalline silicon films deposited by hot-wire chemical vapor deposition;physica status solidi (a);2012-12-20
5. Polycrystalline silicon films fabricated by rapid thermal annealing;Journal of Materials Science: Materials in Electronics;2012-06-15
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