Effect of substrate bias on the properties of microcrystalline silicon films deposited by hot-wire chemical vapor deposition
Author:
Publisher
Wiley
Subject
Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/pssa.201228342/fullpdf
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4. Physical properties of polycrystalline silicon films related to LPCVD conditions
5. Micro-Raman stress characterization of polycrystalline silicon films grown at high temperature
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