Achieving structural control with thin polystyrene-b-polydimethylsiloxane block copolymer films: The complex relationship of interface chemistry, annealing methodology and process conditions-Reference-Cited by-同舟云学术

Achieving structural control with thin polystyrene-b-polydimethylsiloxane block copolymer films: The complex relationship of interface chemistry, annealing methodology and process conditions

Published:2013-11 Issue:11 Volume:49 Page:3445-3454
ISSN:0014-3057
Container-title:European Polymer Journal
language:en
Short-container-title:European Polymer Journal

Author:

O’Driscoll Benjamin M.D.,Kelly Roisin A.,Shaw Matthew,Mokarian-Tabari Parvaneh,Liontos George,Ntetsikas Konstantinos,Avgeropoulos Apostolos,Petkov Nikolay,Morris Michael A.

Publisher

Elsevier BV

Subject

Organic Chemistry,Polymers and Plastics,General Physics and Astronomy,Materials Chemistry

Reference33 articles.

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4. Formation of long-range stripe patterns with sub-10-nm half-pitch from directed self-assembly of block copolymer;Takenaka;J Polym Sci Polym Phys,2010

5. Solvent-vapor-induced tunability of self-assembled block copolymer patterns;Jung;Adv Mater,2009

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