Improved electrical properties of ZnO:Al transparent conducting oxide films using a substrate bias-Reference-Cited by-同舟云学术

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Improved electrical properties of ZnO:Al transparent conducting oxide films using a substrate bias

Published:2006-01 Issue:1-4 Volume:39 Page:107-114
ISSN:0749-6036
Container-title:Superlattices and Microstructures
language:en
Short-container-title:Superlattices and Microstructures

Author:

Lim D.G.,Kim D.H.,Kim J.K.,Kwon O.,Yang K.J.,Park K.I.,Kim B.S.,Lee S.W.,Park M.W.,Kwak D.J.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,General Materials Science

Reference6 articles.

1. Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

2. Electrical and optical properties of ZnO thin film as a function of deposition parameters

3. Glow Discharge Process-sputtering and Plasma Etching;Chapman,1980

4. Bias voltage dependence of properties for depositing transparent conducting ITO films on flexible substrate

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1. Development and characterization of confocal sputtered piezoelectric zinc oxide thin film;Vacuum;2021-02

2. Study on the effects of Ga-2N high co-doping and preferred orientation on the stability, bandgap and absorption spectrum of ZnO;International Journal of Modern Physics B;2017-03-23

3. Effect of In–2N heavy co-doping and preferred orientation on the optical band gap and absorption spectrum of ZnO;Acta Physica Sinica;2015

4. Evaluation of the optoelectronic properties and corrosion behavior of Al2O3-doped ZnO films prepared by dc pulsed magnetron sputtering;Journal of Physics D: Applied Physics;2014-11-13

5. Influence of dosing sequence and film thickness on structure and resistivity of Al-ZnO films grown by atomic layer deposition;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2014-07

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