Fabrication of damage-free Johansson-type doubly curved crystal spectrometer substrate by numerically controlled local wet etching
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference10 articles.
1. �ber ein neuartiges, genau fokussierendes R�ntgenspektrometer
2. Design of a doubly-curved crystal to improve X-ray fluorescence analysis of aerosol particles
3. Wet-etch figuring for precision optical contouring
4. A New Reactive Atom Plasma Technology (RAPT) for Precision Machining: the Etching of ULE® Surfaces
5. Damage-free improvement of thickness uniformity of quartz crystal wafer by plasma chemical vaporization machining
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3. A Simulation Study on Figure Error Correction Using Near-Gaussian Removal Function in Numerical Controlled Local Wet Etching;Key Engineering Materials;2012-11
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5. Design of a general point focusing crystal geometry for x-ray spectroscopy;Journal of the Optical Society of America A;2011-12-07
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