Current status of the NSLS-II optical metrology laboratory
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
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2. A Fizeau interferometry stitching system to characterize X-ray mirrors with sub-nanometre errors;Optics and Lasers in Engineering;2023-02
3. Simulation and measurement of systematic errors of stitching interferometry for high precision X-ray mirrors with large radius of curvature;Applied Optics;2021-09-23
4. Development of high precision mirrors using algorithm-based stitching interferometry and profile coating technique;Advances in Metrology for X-Ray and EUV Optics IX;2020-08-21
5. Deflectometry encoding the measured angle in a time-dependent intensity signal;Review of Scientific Instruments;2019-02
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