Investigation of different oxidation processes for porous Si by XPS-Reference-Cited by-同舟云学术

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Investigation of different oxidation processes for porous Si by XPS

Published:1993-11 Issue:1-6 Volume:57 Page:223-226
ISSN:0022-2313
Container-title:Journal of Luminescence
language:en
Short-container-title:Journal of Luminescence

Author:

Münder H.,Berger M.G.,Frohnhoff S.,Thönissen M.,Lüth H.,Jeske M.,Schultze J.W.

Publisher

Elsevier BV

Subject

Condensed Matter Physics,Biochemistry,General Chemistry,Atomic and Molecular Physics, and Optics,Biophysics

Reference8 articles.

1. Electroluminescence in the visible range during anodic oxidation of porous silicon films

2. A non-destructive study of the microscopic structure of porous Si

3. Si(111) surface oxidation: O 1s core-level study using synchrotron radiation

4. The localization and crystallographic dependence of Si suboxide species at the SiO2/Si interface

Cited by 35 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thermally Carbonized Porous Silicon and Its Recent Applications;Advanced Materials;2018-02-27

2. Oxidation of Mesoporous Silicon;Handbook of Porous Silicon;2018

3. Oxidation of Mesoporous Silicon;Handbook of Porous Silicon;2017

4. Oxidation of Mesoporous Silicon;Handbook of Porous Silicon;2016

5. Reactive wave propagation in energetic porous silicon composites;Combustion and Flame;2014-11

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