Microstructure and magnetron sputtering properties of tungsten target fabricated by low pressure plasma spraying-Reference-Cited by-同舟云学术

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Microstructure and magnetron sputtering properties of tungsten target fabricated by low pressure plasma spraying

Published:2020-02 Issue: Volume:87 Page:105116
ISSN:0263-4368
Container-title:International Journal of Refractory Metals and Hard Materials
language:en
Short-container-title:International Journal of Refractory Metals and Hard Materials

Author:

Wang Yueming,Tang Qiuhao,Chen Deqiang,Liu Xiubo,Yan Jianhui,Xiong Xiang

Funder

National Natural Science Foundation of China

Publisher

Elsevier BV

Subject

General Medicine

Reference25 articles.

1. Making tungsten targets using tungsten oxide powder;Lipski;Nucl. Instrum. Methods Phys. Res. Sect. A,2011

2. Preparation and properties of metal tungsten sputtering target;Gao;World Nonferrous. Met.,2017

3. Manufacture and application of sputtering target materials;Yang;Vacuum,2001

4. The present status and development trend of magnetron sputtering target at home and abroad;Chu;Rare Metal Mater. Eng.,2011

5. The study of preparing of high purity tungsten alloy targets;Bai,2015

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3. The sputtering performance of Ag sputtering targets with different microstructure;Vacuum;2023-04

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