Making tungsten targets using tungsten oxide powder
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference3 articles.
1. Fabrication of 184W target on carbon backing
2. Patent No. US 6,821,557 B2, Nov.23. 2004.
3. Computer-controlled preparation of thin tungsten layers
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Microstructure and Magnetron Sputtering Properties of W/Re Alloy Targets Fabricated by Vacuum Sintering;Journal of Materials Engineering and Performance;2021-06-02
2. Microstructure and magnetron sputtering properties of tungsten target fabricated by low pressure plasma spraying;International Journal of Refractory Metals and Hard Materials;2020-02
3. Influence of Vacuum Chamber Pressure on Microstructure and Properties of Tungsten Target Fabricated by Low Pressure Plasma Spraying;CAILIAO GONGCHENG;2018
4. Fabrication of thin targets for nuclear reaction studies at IUAC;Vacuum;2017-10
5. Isotopic tungsten targets;Journal of Radioanalytical and Nuclear Chemistry;2015-02-28
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