Funder
Korea Institute of Energy Technology Evaluation and Planning
National Research Foundation of Korea
Reference33 articles.
1. L. Breuil, G. El Hajjam, S. Ramesh, A. Ajaykumar, A. Arreghini, L. Zhang, F. Sebaai, L. Nyns, T. Raymaekers, M. Rosmeulen, Integration of Ruthenium-based wordline in a 3-D NAND memory devices, 2020 IEEE International Memory Workshop (IMW), IEEE2020, pp. 1-4.
2. Thermal atomic layer etching of Al2O3, HfO2, and ZrO2 using sequential hydrogen fluoride and dimethylaluminum chloride exposures;Lee;J. Phys. Chem. C,2019
3. Opinion on the use of plasma processes for treatment of foods;Schlüter;Mol. Nutr. Food Res.,2013
4. Electron collision cross-section data for plasma modeling;Huo;IEEE Trans. Plasma Sci.,1999
5. Reactive plasma cleaning and restoration of transition metal dichalcogenide monolayers;Marinov;npj 2D Mater. Appl.,2021