Rate constant and mechanism of the SiH3+SiH3 reaction
Author:
Publisher
Elsevier BV
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Reference20 articles.
1. Mechanistic Studies of Chemical Vapor Deposition
2. Laser Microchemistry and its Application to Electron-Device Fabrication
3. Diffusion Coefficient and Reaction Rate Constant of the SiH3Radical in Silane Plasma
4. Absolute rate constants for the reaction of silyl with nitric oxide, ethylene, propyne, and propylene, and the silyl recombination reaction
5. Mechanism of formation of tri- and tetrasilane in the reaction of atomic hydrogen with monosilane and the thermochemistry of the disilene isomers
Cited by 24 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Determining a Line Strength in the ν3 Band of the Silyl Radical Using Quantum Cascade Laser Absorption Spectroscopy;The Journal of Physical Chemistry A;2019-10-29
2. Physics and Chemistry of Cat-CVD;Catalytic Chemical Vapor Deposition;2019-02-15
3. Elementary processes in silicon hot wire CVD;Thin Solid Films;2006-04
4. Mass Spectrometry of Free Radicals;Chemical Reviews;2002-08-07
5. Comparison of the processes induced by nitrogen dilution on the photodissociation of silane and disilane at 193 nm;Journal of Photochemistry and Photobiology A: Chemistry;2002-07
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3