Theoretical design and computational screening of precursors for atomic layer deposition-Reference-Cited by-同舟云学术

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Theoretical design and computational screening of precursors for atomic layer deposition

Published:2016-09 Issue: Volume:322 Page:94-103
ISSN:0010-8545
Container-title:Coordination Chemistry Reviews
language:en
Short-container-title:Coordination Chemistry Reviews

Author:

Fang Guoyong,Xu Lina,Cao Yanqiang,Li Aidong

Funder

Zhejiang Provincial Natural Science Foundation

National Natural Science Foundation of China

Publisher

Elsevier BV

Subject

Materials Chemistry,Physical and Theoretical Chemistry,Inorganic Chemistry

Reference78 articles.

1. Atomic Layer Deposition for Nanotechnology;Sherman,2008

2. Atomic Layer Deposition of Nanostructured Materials;Pinna,2012

3. Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications;Kääriäinen,2013

4. Atomic Layer Deposition for Semiconductors;Hwang,2014

5. Atomic Layer Deposition (ALD): Fundamentals, Characteristics and Industrial Applications;Valdez,2015

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