The hall effect in W-Cu amorphous alloys
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,General Chemistry
Reference24 articles.
1. On the origin of the positive Hall coefficient in disordered TE-TL alloys
2. J. Ivkov & Bacić, J. Non Cryst. Solids (in press).
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5. Metastable solid solutions in vapor deposited Cu–Cr, Cu–Mo, and Cu–W thin films
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1. The relaxation processes in the Al-(Nb, Mo, Ta, W) binary amorphous thin films;Vacuum;2013-12
2. Hall effect in Al–W thin films;Solid State Communications;2004-02
3. Measurement of resistance and spin-memory loss (spin relaxation) at interfaces using sputtered current perpendicular-to-plane exchange-biased spin valves;Physical Review B;2000-07-01
4. Microhardness properties of Cu-W amorphous thin films;Journal of Materials Science;1998
5. Film thickness variation in a cylindrical magnetron deposition device;Thin Solid Films;1997-01
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