Film thickness variation in a cylindrical magnetron deposition device
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference17 articles.
1. The hall effect in W-Cu amorphous alloys
2. Hybrid modeling of deposition profiles in magnetron sputtering systems
3. Three-Dimensional Simulation of Target Erosion in DC Magnetron Sputtering
4. Monte Carlo calculation of the thermalization of atoms sputtered from the cathode of a sputtering discharge
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