Computational Prediction of Cryogenic Micro-nano Solid Nitrogen Particle Production Using Laval Nozzle for Physical Photo Resist Removal-cleaning Technology-Reference-Cited by-同舟云学术

Computational Prediction of Cryogenic Micro-nano Solid Nitrogen Particle Production Using Laval Nozzle for Physical Photo Resist Removal-cleaning Technology

Published:2015 Issue: Volume:67 Page:607-612
ISSN:1875-3892
Container-title:Physics Procedia
language:en
Short-container-title:Physics Procedia

Author:

Ishimoto Jun,Abe Haruto,Ochiai Naoya

Publisher

Elsevier BV

Subject

General Engineering

Reference10 articles.

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2. Development of CO2 gas cluster cleaning method and its characterization;Choi;Microelectronic Engineering,2013

3. Hattori, T., 2014. Non-aqueous cleaning challenges for preventing damage to fragile nano-structures: A review. ECS Journal of Solid State Science and Technology 3, N3054-N3059. doi:10.1149/2.010401jss.

4. Hoon Kim, T., Busnaina, A., Park, J.G., Kim, D., 2012. Nanoscale particle removal using wet laser shockwave cleaning. ECS Journal of Solid State Science and Technology 1, P70-P77. doi:10.1149/2.001202jss.

5. Ishimoto, J., Oh, U., Koike, T., Ochiai, N., 2014. Photoresist removal-cleaning technology using cryogenic micro-solid nitrogen spray. ECS Journal of Solid State Science and Technology 3, N3046-N3053. doi:10.1149/2.009401jss.

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